Browsing by Author "Lam, Michael"
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Publication 3D Mask modeling for EUV lithography
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.832224Publication EUV flare and proximity modeling and model-based correction
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.79690SPublication Experimental determination and accurate modeling of the EUV ADT flare
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.41505Publication Machine Learning Enhanced Optical Proximity Correction Modeling for High-NA EUV Lithography
Publication Modeling laser bandwidth for OPC applications
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741O