Browsing by Author "Chang, C-H."
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Publication Characterization of annealing and dopant activation processes using Differential Hall Effect Metrology (DHEM)
Proceedings paper2021, Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11, 30/05/2021, p.113Publication Ultimate Layer Stacking Technology for High Density Sequential 3D Integration
;Radu, I. ;Nguyen, B-Y. ;Chang, C-H. ;Neve, C. Roda ;Gaudin, G. ;Besnard, G. ;Batude, P.Loup, V.Proceedings paper2023, International Electron Devices Meeting (IEDM), 2023-12-09